On Optimization of Manufacturing of Field-effect Transistors to Increase Their Integration Rate in the Framework of a Double-tail Dynamic Comparator

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E. L. Pankratov

Abstract

In this paper, we introduce an approach to increase integration rate of elements of a double-tail dynamic comparator. Framework the approach we consider a heterostructure with special configuration. Several specific areas of the heterostructure should be doped by diffusion or ion implantation. Annealing of dopant and/or radiation defects should be optimized.

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How to Cite
Pankratov, E. L. . (2021). On Optimization of Manufacturing of Field-effect Transistors to Increase Their Integration Rate in the Framework of a Double-tail Dynamic Comparator. Asian Journal of Computer Science Engineering(AJCSE), 6(4). Retrieved from http://ajcse.info/index.php/ajcse/article/view/171
Section
Review Article

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